EUV-LDP-SOURCE FOR EXPOSURE AND ANALYSIS FACILITY

EBL2LayoutFrameTo operate an EUV LDP Source, a tin plasma must be generated and controlled in a high vacuum environment using high voltage. Together with our customer we have developed, built and programmed the entire environment of such an EUV source.
 
EUV stands for Extreme Ultraviolent Light and LDP for Laser-assisted Discharge-produced Plasma. EUV is needed to manufacture the latest generation of semiconductor devices such as memories and processors.
 

The Exposure an Analysis Facility can be used to test the impact of EUV on a wide range of materials.

 #EUVL #LASER #HIGH_Voltage #HIGH_VACUUM #SIEMENS_PLC #NI_CRIO

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