REALTIME PLASMA CONTROL FOR EUV-LDP-SOURCES

ResonantChargingUp to 15000 times per second a defined high voltage must be generated between two electrodes by resonant charging and discharged by trigger lasers. We have developed such a system from scratch and achieved unprecedented accuracy.

EUV LDP sources are required for mask inspection tools, which are needed to manufacture the latest generation of semiconductors such as memories and processors.
 

Our development stabilizes the plasma generation so that energy drifts can be regulated better.

#mask_semicon #EUV

 

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